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Amorphous insulating MoS films deposited by magnetron sputtering as a low-index optical coating

S.G. Martanov, E.V. Tarkaeva, A.V. Muratov, A.V. Lubenchenko, O.N. Pavlov, A.G. Vitukhnovsky, and A.Yu. Kuntsevich

PreprintUso en el mundo real

En palabras de los autores

While much effort are now concentrated on exploration of crystalline form of MoS as a two-dimensional material, we show that room-temperature DC magnetron sputtering from pressurized MoS powder target produces amorphous MoS films with optical properties fundamentally different from those of crystalline MoS. The films were found to have a sulfur content of approximately , indicating sulfur deficiency. They are optically isotropic and exhibit rather low optical losses, with a refractive index of about 2 over the visible and near-infrared spectral range. Their compatibility with lift-off lithography and dry etching makes amorphous MoS a promising material for integrated photonic applications.

Resultado principalEl resumen no menciona limitaciones.

Apareció: martes, 22 de septiembre. arXiv. Preprint, todavía sin revisión por pares.

Comentario de los autores: 6 pages, 5 figures