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Amorphous insulating MoS films deposited by magnetron sputtering as a low-index optical coating

S.G. Martanov, E.V. Tarkaeva, A.V. Muratov, A.V. Lubenchenko, O.N. Pavlov, A.G. Vitukhnovsky, and A.Yu. Kuntsevich

PreprintReal-world use

In the authors' words

While much effort are now concentrated on exploration of crystalline form of MoS as a two-dimensional material, we show that room-temperature DC magnetron sputtering from pressurized MoS powder target produces amorphous MoS films with optical properties fundamentally different from those of crystalline MoS. The films were found to have a sulfur content of approximately , indicating sulfur deficiency. They are optically isotropic and exhibit rather low optical losses, with a refractive index of about 2 over the visible and near-infrared spectral range. Their compatibility with lift-off lithography and dry etching makes amorphous MoS a promising material for integrated photonic applications.

Main resultThe abstract does not state a limitation.

Appeared: Tuesday, September 22. arXiv. Preprint, not yet peer-reviewed.

Authors' comment: 6 pages, 5 figures